Plasmonic metamask

plasmonic metamask

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Resolution enhancement in far-field photolithography is demonstrated using a plasmonic metamask in the proximity regime, in which Fresnel diffraction is. It is used for generating light beams carrying optical singularities. Another possibility is based on the phenomenon of photoalignment of LCs by. Mentioning: 2 - Resolution enhancement in far-field photolithography is demonstrated using a plasmonic metamask in the proximity regime, in which Fresnel.
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High-throughput diffraction-assisted surface-plasmon-polariton coupling by a super-wavelength slit. In the far-field photolithography regime, the modulation of the higher orders of the Fresnel diffraction components strongly affects the photoresist visibility. Pati, Y. Enhanced near-field resolution in midinfrared using metamaterials.